ASHING SYSTEMS 

Barrel Ashing Systems with chambers from 100mm to 450mm diameter, for the removal of photoresist, surface treatment of plastics (Hydrophillisation) and chemical analysis of carbon compounds.

Features

  • Simple Process control
  • Reliable Solid state RF Technology
  • Automatic matching for ease of operation
 Barrel Ashing Systems with chambers from 100mm to 450 mm diameter and Custom designed systems for plasma and reactive ion etching of thin films - click here for full specification.

600W Plasma ashing system.